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Kinetics of HfO2 etching and impurity elimination with atomichydrogen beamsmore_vert
Kinetics of HfO2 etching and impurity elimination with atomichydrogen beamsclose

Kinetics of HfO2 etching and impurity elimination with atomichydrogen beams

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Etiquetas: hidrógeno atómico, atomic hydrogen, ultra-thin films, capas ultra-delgadas, impurity, hfo2, impureza, ataque, hafnio, etching, hafnium

Thermal stability of HfO2-on-GaAs nanopatternsmore_vert
Thermal stability of HfO2-on-GaAs nanopatternsclose

Thermal stability of HfO2-on-GaAs nanopatterns

tipo de documento Publicacion

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Autores: Tejedor Jorge, Paloma, Molina Aldereguia, Jon, Vázquez Burgos, Luís, Benedicto Córdoba, Marcos, Galiana Blanco, Beatriz

Etiquetas: recocido, hfo2, high-k, transistor, nanotecnología, nanotechnology, eds, patterns, gaas, patrones, afm, iii-v, tem, annealing

Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS applicationmore_vert
Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS applicationclose

Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

tipo de documento Publicacion

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Autores: Tejedor Jorge, Paloma, Cherkaoui, K., Molina Aldereguia, Jon, Vázquez Burgos, Luís, Benedicto Córdoba, Marcos, Monaghan, S., Hurley, P.K., Galiana Blanco, Beatriz

Etiquetas: hrsem, high-k, linl, hfo2, tem. eds, nanotecnología, transistor, nanotechnology, rie, gaas, afm, iii-v