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A novel characterization tool for the study of dielectric breakdown of ultra-thin oxide MOS structures

A novel characterization tool for the study of dielectric breakdown of ultra-thin oxide MOS structures

A novel characterization tool for the study of dielectric breakdown of ultra-thin oxide MOS structures

tipo de documento Publicacion

Etiquetas: fluctuations, noise measurement, testing, stress, voltage, instruments, microcomputers, electric breakdown, dielectric breakdown, low-frequency noise

Publicado en: libro: 16th ieee instrumentation and measurement technology conference - imtc 1999, página inicial: 1923-1926, página final:

Fecha publicación: 24/05/1999

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