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Modified energetic and growth kinetics on H-terminated GaAs (110more_vert
Modified energetic and growth kinetics on H-terminated GaAs (110close

Modified energetic and growth kinetics on H-terminated GaAs (110

tipo de documento Publicacion

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Autores: Teichert, C., Benedicto Córdoba, Marcos, Lorbek, S., Diez Merino, Laura, Hlawacek, G., Galiana Blanco, Beatriz

Etiquetas: ffm, transistor, crecimiento, growth, simulación, nanotecnología, nanotechnology, gaas, simulation, mbe, afm

Step-step interactions on GaAs(110) nanopatternsmore_vert
Step-step interactions on GaAs(110) nanopatternsclose

Step-step interactions on GaAs(110) nanopatterns

tipo de documento Publicacion

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Autores: Tejedor Jorge, Paloma, Benedicto Córdoba, Marcos, Galiana Blanco, Beatriz

Etiquetas: growth, transistor, simulación, crecimiento, nanotecnología, nanotechnology, gaas, simulation, afm

Nucleation of SrTiO3 3D islands and nanorings on Si substratesmore_vert
Nucleation of SrTiO3 3D islands and nanorings on Si substratesclose

Nucleation of SrTiO3 3D islands and nanorings on Si substrates

tipo de documento Publicacion

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Autores: Tejedor Jorge, Paloma, Vázquez Burgos, Luís, Benedicto Córdoba, Marcos, Galiana Blanco, Beatriz

Etiquetas: si, sto, ftir, nanotehcnology, transistor, nanotecnología, islas, islands, anillos, rings, afm, tem

Thermal stability of HfO2-on-GaAs nanopatternsmore_vert
Thermal stability of HfO2-on-GaAs nanopatternsclose

Thermal stability of HfO2-on-GaAs nanopatterns

tipo de documento Publicacion

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Autores: Tejedor Jorge, Paloma, Molina Aldereguia, Jon, Vázquez Burgos, Luís, Benedicto Córdoba, Marcos, Galiana Blanco, Beatriz

Etiquetas: recocido, hfo2, high-k, transistor, nanotecnología, nanotechnology, eds, patterns, gaas, patrones, afm, iii-v, tem, annealing

Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS applicationmore_vert
Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS applicationclose

Fabrication of HfO2 patterns by laser interference nanolithography and selective dry etching for III-V CMOS application

tipo de documento Publicacion

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Autores: Tejedor Jorge, Paloma, Cherkaoui, K., Molina Aldereguia, Jon, Vázquez Burgos, Luís, Benedicto Córdoba, Marcos, Monaghan, S., Hurley, P.K., Galiana Blanco, Beatriz

Etiquetas: hrsem, high-k, linl, hfo2, tem. eds, nanotecnología, transistor, nanotechnology, rie, gaas, afm, iii-v